常见问题

什么是知识产权?
Intellectual property is intangible personal property that can be characterized as invention, discovery, know-how, technological development, computer software, or even 商业秘密. It is protected by copyrights, trademarks and patents and is an asset 致其主人. If protected adequately, 知识产权 can be managed to benefit 所有者和发明者以及公众利益.
什么是专利?
A patent is a grant of the right to exclude others from making, using, or selling an invention and includes a right to license that invention to others to make, use, 或者卖掉它. 专利保护期限为自首次申请起20年.
什么是版权?
Copyright is a form of protection provided to the authors of “original works of authorship,” including literary, dramatic, musical, artistic, and certain other intellectual works. This protection is available to both published and unpublished works.
什么是商标??
A trademark is a mechanism that allows for the protection of signs, logos, phrases, 代表产品或服务的表达和设计.  商标可以包括 a device, brand, label, name, signature, word, letter, numerical, shape of goods, packaging, color or combination of colors, smell, sound, movement or any combination thereof which is capable of distinguishing goods and services of one business from 其他人的. Trademarks need to be maintained through lawful use otherwise they 到期.
什么是商业秘密?
A 商业秘密 can include a formula, pattern, compilation, program, device, method, technique or process that gives an opportunity of a company to obtain an economic 比那些不知道或不使用它的竞争对手更有优势.  商业秘密只受保护 因为这些信息仍然是秘密. 
什么是公开披露?
Public disclosure is a key event in the patentability of an invention. 任何表示, publication, poster session, web posting, seminar, thesis defense or other dissemination of the enabling technology embodied in the invention is considered a public disclosure 开始了专利的倒计时. 一旦公开披露,这种能力 to file foreign patents is lost and a one year period begins for filing patents in 美国.
发明权和作者权的区别是什么?
The difference between authorship and inventorship is an important distinction. 作者 on a manuscript follows traditional academic practice in recognizing various contributions 对论文的准备. 然而,发明家是一个有贡献的人 substantively to the conception or reduction to practice of an invention. 最后一个 determination of inventorship typically is made by a patent counsel once the patent 申请已准备好. 发明人身份和作者身份并不等同,而且是不正确的 发明可以导致专利的无效.
我如何与行业合作?
The 十大玩彩信誉平台 is actively collaborating with industry partners.  If you currently have a 的关系 with a company, we can help you formalize that 的关系.  如果您希望发展新的关系,我们可以提供便利 您与主要行业合作伙伴之间的互动.  通过电话联系OCIC +1(251) 460-7932或通过电子邮件 techtransfer@xizitax.com 进一步讨论细节.
我该去哪里搭MTA?
MTAs for both incoming and outgoing materials are located in the MTA navigation tab 在OCIC网站上.
我如何提交和发明披露?
To submit an invention disclosure click on the “Submit Invention Disclosure” button 在OCIC的主页上.  这将带您到在线发明家门户网站.  的详细 instructions on how to submit an invention disclosure, follow this link 访问inventor门户用户指南.
如何使用Inventor Portal
发明人门户网站的指南可以通过以下方式找到 link.
我如何在技术许可方面接近美国?
You can browse currently available technologies by clicking on the “搜索 Technologies” 按钮.  您也可以致电+1(251)460-7932与OCIC联系 或者通过电子邮件 techtransfer@xizitax.com.
如何与美国合作?
The 十大玩彩信誉平台 is open to many different types of collaboration that 对双方都有利吗.   我们积极参与学术合作, material transfers, visiting scholars, industry sponsored 研究, and non-profit SBIR/STTR拨款奖励的合作伙伴.  要与美国合作,您可以联系OCIC 请致电+1(251)460-7932或发电子邮件 techtransfer@xizitax.com.
▼   How does USA collaborate with small businesses on grant opportunities?
The OCIC actively seeks industry partners that are interested in applying for small 商业资助机会.  我们认为SBIR/ str是一个很好的发展机制 university technology and strengthen 的关系s with small business partners.  To collaborate with a USA faculty member or utilize one of our technologies in your small business grant application, contact OCIC 请致电+1(251)460-7932或发电子邮件 techtransfer@xizitax.com.
我可以在发表期刊文章的同时申请专利吗?
你可以在期刊上发表文章,同时申请专利.  然而,这篇文章, or any form of public disclosure, will limit our ability to file a patent outside 美国的.  In 美国, inventors have a one-year grace period after information is 公开披露申请专利.  最好尽快与我们办公室联系 as possible, especially if you are thinking about publishing information related to 知识产权.  我们永远不会阻止你出版,但我们可以讨论 a strategy that will allow for optimal 知识产权 protection and publication.